METHOD FOR FORMING RESIST PATTERN, METHOD FOR FORMING PATTERN, SOLAR CELL AND POSITIVE RESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To improve removability of a resist film in a recessed part of a support body.SOLUTION: A method for forming a resist pattern includes steps of: applying the following positive resist composition on a support body including a solar cell substrate to form a resist film; selectively irradiating the resist film with light to expose; and developing the exposed resist film with an alkali solution to remove the exposed part. The positive resist composition comprises a novolac resin (A) and a photosensitive agent (B) including an ester compound of phenols (B1) having a tris(hydroxyphenyl)methane skeleton with a quinone diazide group-containing sulfonyl compound (B2), and shows 10% or more transmittance for light at a wavelength of 365 nm in a resist film of the composition having 3 μm film thickness.