发明名称 GRAPHENE DEPOSITION AND GRAPHENATED SUBSTRATES
摘要 Methods, devices, systems and/or articles related to techniques for forming a graphene film on a substrate, and the resulting graphene layers and graphenated substrates are generally disclosed. Some example techniques may be embodied as methods or processes for forming graphene. Some other example techniques may be embodied as devices employed to manipulate, treat, or otherwise process substrates, graphite, graphene and/or graphenated substrates as described herein. Graphene layers and graphenated substrates produced by the various techniques and devices provided herein are also disclosed.
申请公布号 US2013280829(A1) 申请公布日期 2013.10.24
申请号 US201313920814 申请日期 2013.06.18
申请人 NEW JERSEY INSTITUTE OF TECHNOLOGY 发明人 GREBEL HAIM;BANERJEE AMRITA
分类号 H01L21/02 主分类号 H01L21/02
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