| 摘要 |
The invention relates to a method for producing a substrate provided with a coating on at least a portion of at least one of the surfaces thereof, including a step of depositing said coating onto said substrate, then a step of heat-treating said coating using pulsed or continuous laser radiation focused on said coating in the form of at least one laser line, the wavelength of which is within a range of 400 to 1500 nm, said heat treatment being configured such that a relative displacement movement is generated between the substrate and the or each laser line, the speed of which is at least 3 meters per minute, the or each laser line having a beam quality factor (BPP) of at most 3 mm mrad, and, measured at the point at which the or each laser line is focused on said coating, a linear power divided by the square root of the duty cycle of at least 200 W/cm, a length of at least 20 mm, and a distribution of widths along the or each line such that the mean width is at least 30 micrometers and the difference between the largest width and the smallest width is at most 15% of the value of the mean width. |
