发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <p>A layer including one metal from titanium, tungsten, molybdenum, and chromium is formed on the obverse surface of a SiC substrate (11) and heated, whereby a Schottky electrode (16) is formed on the SiC substrate (11). A surface electrode (17) is formed on the surface of the Schottky electrode (16) from aluminum or aluminum containing silicon. When the surface electrode (17) is formed, heating is performed at 100°C to 500°C, whereby the concave/convex features on the Schottky electrode (16) are covered by the surface electrode (17) in a satisfactory manner, and the reflectivity of the surface electrode (17) becomes suitable for image recognition by an automatic wire bonding device. It is thereby possible to form a surface electrode that covers the concave/convex features of the Schottky contact in a satisfactory manner and has the optimum reflectivity for image recognition such as for positioning.</p>
申请公布号 WO2013157335(A1) 申请公布日期 2013.10.24
申请号 WO2013JP57312 申请日期 2013.03.14
申请人 FUJI ELECTRIC CO., LTD. 发明人 IMAI, FUMIKAZU
分类号 H01L21/329;H01L29/47;H01L29/861;H01L29/868;H01L29/872 主分类号 H01L21/329
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