发明名称 EXPOSURE APPARATUS
摘要 <p>PURPOSE: A lenticular exposure apparatus including a lenticular assembly is provided to easily perform a large-sized exposure by extending the transfer area of a light source device. CONSTITUTION: A light source device (2) emits light to a film (6) with a pattern. A photoresist (7) is exposed by the light to form the same pattern. The light source device includes a light source and a lenticular assembly. A light source device moves on the film. The lenticular assembly comprises a convex lenticular and a concave lenticular.</p>
申请公布号 KR20130116674(A) 申请公布日期 2013.10.24
申请号 KR20120039281 申请日期 2012.04.16
申请人 SEONG, NAK HOON 发明人 SEONG, NAK HOON
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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