| 摘要 |
The invention relates to a microwave plasma generating device with a plasma chamber. At least one microwave generating device is provided outside of the plasma chamber, and the microwaves of said microwave generating device are coupled into the plasma chamber via at least one microwave incoupling device. The microwave incoupling device has an inner conductor which leads into the plasma chamber through at least one chamber wall of the plasma chamber, an insulating tube which encloses the inner conductor and separates the inner conductor from an interior of the plasma chamber, and at least one outer conductor which leads into the plasma chamber through the at least one chamber wall and which is coaxial to the inner conductor but is not provided over the entire circumference of the inner conductor. The outer conductor has at least one outer conductor end in the plasma chamber. The inner conductor and the outer conductor form a microwave line, an outlet of microwaves out of the microwave line being provided in the plasma chamber in order to generate a microwave plasma in the interior of the plasma chamber. According to the invention, at least one plasma electrode which is electrically insulated from the chamber wall and to which a DC, NF, or HF voltage can be applied is provided in the interior of the plasma chamber coaxially to the inner conductor. The microwave plasma can be brought into electric contact with the plasma electrode such that the function of the outer conductor can be transferred at least partly to the microwave plasma. The invention further relates to a method for operating such a microwave plasma generating device. |
