发明名称 PHOTOELECTRIC CONVERSION DEVICE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To obtain a photoelectric conversion device manufacturing method which can manufacture a photoelectric conversion device excellent in photoelectric conversion properties without increasing the number of processes.SOLUTION: A photoelectric conversion device manufacturing method comprises: a first laser patterning process of partially removing a power generation layer 3 on a transparent conductive layer 2 by laser to expose the transparent conductive layer 2; a second laser patterning process of partially removing the power generation layer 3 on the transparent conductive layer 2 and a back reflection electrode layer 4 by laser to expose the transparent conductive layer 2; and a third laser patterning process of removing the transparent conductive layer 2, the power generation layer 3 and the back reflection electrode layer 4 at a peripheral part of a translucent substrate 1 by laser to expose the peripheral part of the translucent substrate 1. The photoelectric conversion device manufacturing method comprises a step of supplying a process solution 6 having a property of inactivating defects in material which forms the power generation layer 3 to a processed part by laser to remove a residue generated by the laser processing in any of the first laser patterning process, the second laser patterning process and the third laser patterning process.
申请公布号 JP2013219064(A) 申请公布日期 2013.10.24
申请号 JP20100176213 申请日期 2010.08.05
申请人 MITSUBISHI ELECTRIC CORP 发明人 YAMAGUCHI SHINSAKU;NAKAMURA KEISUKE
分类号 H01L31/04 主分类号 H01L31/04
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