| 摘要 |
PURPOSE: A metal organic chemical vapor deposition apparatus is provided to reduce the use amount of gas by using a push member arranged in a lid assembly. CONSTITUTION: A reactor body(110) includes a bottom wall(112) and a sidewall(111). A lid assembly(120) is connected to the sidewall of the reactor body and covers the upper part of the reactor body. A susceptor(130) is arranged in the reactor body and supports an object substrate. A gas distributor(140) rotates and injects the gas to the object substrate. A push member(200) guides the gas injected from the gas distributor to a susceptor. |
