发明名称 PLASMA GENERATION AND PROCESSING WITH MULTIPLE RADIATION SOURCES
摘要 Methods and apparatus are provided for igniting, modulating, and sustaining a plasma for various plasma processes and treatments. In one embodiment, a plasma is ignited by subjecting a gas in a multi-mode processing cavity to electromagnetic radiation having a frequency between about 1 MHz and about 333 GHz in the presence of a plasma catalyst, which may be passive or active. A passive plasma catalyst may include, for example, any object capable of inducing a plasma by deforming a local electric field. An active plasma catalyst can include any particle or high energy wave packet capable of transferring a sufficient amount of energy to a gaseous atom or molecule to remove at least one electron from the gaseous atom or molecule, in the presence of electromagnetic radiation.
申请公布号 EP1502489(B1) 申请公布日期 2013.10.23
申请号 EP20030738900 申请日期 2003.05.07
申请人 BTU INTERNATIONAL, INC. 发明人 KUMAR, SATYENDRA;KUMAR, DEVENDRA
分类号 B01J7/00;H05H1/46;A62D3/00;B01D53/86;B01D53/92;B01J19/08;B01J19/12;B01J37/34;B22F3/105;C01B3/02;C21D1/06;C21D1/09;C21D1/38;C22B4/00;F01N3/08;F01N3/10;F01N3/20;F01N3/24;F01N3/28;F01N3/30;F01N9/00;F01N13/10;F27B17/00;F27D3/12;F27D11/08;F27D11/12;G21K5/00;H01J37/32;H01M8/06;H05B6/68;H05B6/78;H05B6/80;H05H1/24 主分类号 B01J7/00
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