| 摘要 |
<p>Provided are a method for filling a liquid material, and an apparatus and a program for the same, which make it possible, without changing a moving speed of an ejection device, to correct a change in ejection amount and to stabilize an application shape. Disclosed are: a method for filling a liquid material into a gap between a substrate and a work by using the capillary action; and an apparatus and a program for the same. The method comprises the steps of: generating an application pattern consisting of a plurality of application areas continuous to one another; assigning a plurality of ejection cycles, each obtained by combining the number of ejection pulses and the number of pause pulses at a predetermined ratio therebetween, to each of the application areas; and measuring an ejection amount at correction intervals and calculating a correction amount for the ejection amount. The method further comprises at least any one of the steps of: adjusting the numbers of ejection pulses and the numbers of pause pulses, which are included in the application pattern, based on the calculated correction amount; and adjusting the length of any application area continuous to at least one application area without changing ejection amounts per unit time in the respective application areas.</p> |
