发明名称 SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD.
摘要 A substrate holder for use in a lithographic apparatus, the substrate holder including: a main body having a surface; a plurality of burls projecting from the surface and having end surfaces to support a substrate; and a thin film stack on the main body surface and forming an electric component, the thin film stack having a conductive layer configured to distribute electrical charge substantially uniformly throughout a plane of the stack in which the conductive layer is positioned.
申请公布号 NL2010472(A) 申请公布日期 2013.10.23
申请号 NL20132010472 申请日期 2013.03.19
申请人 ASML NETHERLANDS B.V. 发明人 LAFARRE RAYMOND;DZIOMKINA NINA;KARADE YOGESH;RODENBURG ELISABETH;SINGH HARMEET
分类号 G03F7/20;H01L21/683 主分类号 G03F7/20
代理机构 代理人
主权项
地址