发明名称 |
SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD. |
摘要 |
A substrate holder for use in a lithographic apparatus, the substrate holder including: a main body having a surface; a plurality of burls projecting from the surface and having end surfaces to support a substrate; and a thin film stack on the main body surface and forming an electric component, the thin film stack having a conductive layer configured to distribute electrical charge substantially uniformly throughout a plane of the stack in which the conductive layer is positioned. |
申请公布号 |
NL2010472(A) |
申请公布日期 |
2013.10.23 |
申请号 |
NL20132010472 |
申请日期 |
2013.03.19 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
LAFARRE RAYMOND;DZIOMKINA NINA;KARADE YOGESH;RODENBURG ELISABETH;SINGH HARMEET |
分类号 |
G03F7/20;H01L21/683 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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