| 摘要 |
PURPOSE: A concentration measuring device utilized in a manufacturing process is provided to calibrate without stopping a semiconductor manufacturing process and to accurately measure the concentration of first fluid while the first fluid flows. CONSTITUTION: A concentration measuring device (4) utilized in a manufacturing process includes a body (3), a density measuring unit (441), a condition signal receiving unit (442), and a calibration unit (443). The body outputs condition signals indicating the sort of second fluid flowing in a passage (34). The concentration measuring unit measures the concentration of the fluid flowing in the passage. The condition signal receiving unit receives the condition signals from the body. The calibration unit acquires a reference measurement value, which is a reference measurement value, measured by the concentration measuring unit during a period in which a flow of the second fluid in the passage is determined by the condition signals. The calibration unit calibrates the concentration measuring unit based on the reference measurement value. [Reference numerals] (1) Process chamber; (100) Semiconductor manufacturing system; (3) Liquid medicine supply device; (31) Undiluted solution inlet port; (32) Diluted solution inlet port; (33) Mixing unit; (34) Liquid transferring passage; (35) Nozzle unit; (36) Control unit; (4) Concentration measuring device; (41) Cell; (42) Light source unit; (43) Light detecting unit; (44) Information processing device; (441) Concentration measuring unit; (442) Condition signal receiving unit; (443) Calibration unit; (AA,CC) Undiluted solution; (B) Semiconductor substrate; (BB) Diluted solution |
