发明名称 SUBSTRATE POSITION ALIGNMENT MECHANISM, VACUUM PRECHAMBER AND SUBSTRATE PROCESSING SYSTEM HAVING SAME
摘要 A substrate position alignment mechanism performs position alignment of a substrate supported by each of one or more substrate support units in a chamber where the substrate is accommodated. Further, the substrate position alignment mechanism includes one or more position alignment members, each of which is rotated to make a contact with a side of the substrate in the chamber.
申请公布号 KR101321612(B1) 申请公布日期 2013.10.23
申请号 KR20100073561 申请日期 2010.07.29
申请人 发明人
分类号 H01L21/02;H01L21/68 主分类号 H01L21/02
代理机构 代理人
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