发明名称
摘要 <P>PROBLEM TO BE SOLVED: To provide a sputtering target composed of a zinc oxide sintered compact in which the generation of cracking and arcing is reduced. <P>SOLUTION: The sputtering target uses a zinc oxide sintered compact in which sintered compact density is 5.3 to 5.5 g/cm<SP>3</SP>and the ratio between a Young's modulus and bending strength, E/&sigma; is 300 to 1,500. The zinc oxide sintered compact essentially consists of ZnO, and is composed of Al<SB>2</SB>O<SB>3</SB>present on the grain boundaries and in the grains of ZnO and ZnAl<SB>2</SB>O<SB>4</SB>produced by reaction between ZnO and Al<SB>2</SB>O<SB>3</SB>and present on the grain boundaries and in the grains of ZnO. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP5324889(B2) 申请公布日期 2013.10.23
申请号 JP20080288259 申请日期 2008.11.10
申请人 发明人
分类号 C23C14/34;C04B35/453 主分类号 C23C14/34
代理机构 代理人
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