发明名称 |
Apparatus for radial delivery of gas to a chamber and methods of use thereof |
摘要 |
Apparatus for the delivery of a gas to a chamber and methods of use thereof are provided herein. In some embodiments, a gas distribution system for a process chamber may include a body having a first surface configured to couple the body to an interior surface of a process chamber, the body having a opening disposed through the body; a flange disposed proximate a first end of the opening opposite the first surface of the body, the flange extending inwardly into the opening and configured to support a window thereon; and a plurality of gas distribution channels disposed within the body and fluidly coupling a channel disposed within the body and around the opening to a plurality of holes disposed in the flange, wherein the plurality of holes are disposed radially about the flange.
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申请公布号 |
US8562742(B2) |
申请公布日期 |
2013.10.22 |
申请号 |
US20100907947 |
申请日期 |
2010.10.19 |
申请人 |
LEE JARED AHMAD;SALINAS MARTIN JEFF;AGARWAL ANKUR;GOLD EZRA ROBERT;CRUSE JAMES P.;PAL ANIRUDDHA;NGUYEN ANDREW;APPLIED MATERIALS, INC. |
发明人 |
LEE JARED AHMAD;SALINAS MARTIN JEFF;AGARWAL ANKUR;GOLD EZRA ROBERT;CRUSE JAMES P.;PAL ANIRUDDHA;NGUYEN ANDREW |
分类号 |
C23C16/00;C23C16/455;H01L21/3065 |
主分类号 |
C23C16/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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