发明名称 Memory device having an integrated two-terminal current limiting resistor
摘要 A resistor structure incorporated into a resistive switching memory cell or device to form memory devices with improved device performance and lifetime is provided. The resistor structure may be a two-terminal structure designed to reduce the maximum current flowing through a memory device. A method is also provided for making such memory device. The method includes depositing a resistor structure and depositing a variable resistance layer of a resistive switching memory cell of the memory device, where the resistor structure is disposed in series with the variable resistance layer to limit the switching current of the memory device. The incorporation of the resistor structure is very useful in obtaining desirable levels of device switching currents that meet the switching specification of various types of memory devices. The memory devices may be formed as part of a high-capacity nonvolatile memory integrated circuit, which can be used in various electronic devices.
申请公布号 US8563366(B2) 申请公布日期 2013.10.22
申请号 US201213407359 申请日期 2012.02.28
申请人 PRAMANIK DIPANKAR;CHIANG TONY P.;LEE MANKOO;INTERMOLECULAR INC.;KABUSHIKI KAISHA TOSHIBA;SANDISK 3D LLC 发明人 PRAMANIK DIPANKAR;CHIANG TONY P.;LEE MANKOO
分类号 H01L29/8605 主分类号 H01L29/8605
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