发明名称 Method for manufacturing photovoltaic device
摘要 A photovoltaic device manufacturing method is disclosed. Methods include manufacturing a photovoltaic cell using nanoimprint technology to define individual cell units of the photovoltaic device. The methods can include providing a substrate; forming a first conductive layer over the substrate; forming first grooves in the first conductive layer using a nanoimprint and etching process; forming an absorption layer over the first conductive layer, the absorption layer filling in the first grooves; forming second grooves in the absorption layer using a nanoimprint process; forming a second conductive layer over the absorption layer, the second conductive layer filling in the second grooves; and forming third grooves in the second conductive layer and the absorption layer, thereby defining a photovoltaic cell unit.
申请公布号 US8563351(B2) 申请公布日期 2013.10.22
申请号 US20100823667 申请日期 2010.06.25
申请人 TU CHIH-CHIANG;CHEN CHUN-LANG;TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 TU CHIH-CHIANG;CHEN CHUN-LANG
分类号 H01L21/00 主分类号 H01L21/00
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