发明名称 |
Method for manufacturing photovoltaic device |
摘要 |
A photovoltaic device manufacturing method is disclosed. Methods include manufacturing a photovoltaic cell using nanoimprint technology to define individual cell units of the photovoltaic device. The methods can include providing a substrate; forming a first conductive layer over the substrate; forming first grooves in the first conductive layer using a nanoimprint and etching process; forming an absorption layer over the first conductive layer, the absorption layer filling in the first grooves; forming second grooves in the absorption layer using a nanoimprint process; forming a second conductive layer over the absorption layer, the second conductive layer filling in the second grooves; and forming third grooves in the second conductive layer and the absorption layer, thereby defining a photovoltaic cell unit.
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申请公布号 |
US8563351(B2) |
申请公布日期 |
2013.10.22 |
申请号 |
US20100823667 |
申请日期 |
2010.06.25 |
申请人 |
TU CHIH-CHIANG;CHEN CHUN-LANG;TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
TU CHIH-CHIANG;CHEN CHUN-LANG |
分类号 |
H01L21/00 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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地址 |
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