发明名称 |
Methods, apparatus and computer program products for fabricating masks and semiconductor devices using model-based optical proximity effect correction and lithography-friendly layout |
摘要 |
Design rules for circuit patterns of a semiconductor device are identified, and schematic layouts of the circuit patterns are generated according to the design rules. Lithography friendly layout (LFL) circuit patterns are generated from the schematic layouts. Target layout circuit patterns are generated from the LFL circuit patterns. Optical proximity effect correction (OPC) is performed on the target layout circuit patterns to generate OPC circuit patterns. A mask is fabricated from the OPC circuit patterns, and may be used fabricate a semiconductor device.
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申请公布号 |
US8563197(B2) |
申请公布日期 |
2013.10.22 |
申请号 |
US20080238884 |
申请日期 |
2008.09.26 |
申请人 |
SUH SUNG-SOO;LEE SUK-JOO;PARK YONG-HEE;LEE MI-KYEONG;SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
SUH SUNG-SOO;LEE SUK-JOO;PARK YONG-HEE;LEE MI-KYEONG |
分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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