发明名称 Dual storage node memory
摘要 An embodiment of the present invention is directed to a memory cell. The memory cell includes a first charge storage element and a second charge storage element, wherein the first and second charge storage elements include nitrides. The memory cell further includes an insulating layer formed between the first and second charge storage elements. The insulating layer provides insulation between the first and second charge storage elements.
申请公布号 US8564042(B2) 申请公布日期 2013.10.22
申请号 US20070702845 申请日期 2007.02.05
申请人 CHEUNG FRED;KINOSHITA HIROYUKI;LEE CHUNGHO;SUN YU;CHANG CHI;SPANSION LLC 发明人 CHEUNG FRED;KINOSHITA HIROYUKI;LEE CHUNGHO;SUN YU;CHANG CHI
分类号 H01L29/94 主分类号 H01L29/94
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