发明名称 Coaxial solder bump support structure
摘要 A solder bump support structure and method of manufacturing thereof is provided. The solder bump support structure includes an inter-level dielectric (ILD) layer formed over a silicon substrate. The ILD layer has a plurality of conductive vias. The structure further includes a first insulation layer formed on the ILD layer. The solder bump support structure further includes a pedestal member formed on the ILD layer which includes a conductive material formed above the plurality of conductive vias in the ILD layer coaxially surrounded by a second insulation layer. The second insulation layer is thicker than the first insulation layer. The structure further includes a capping under bump metal (UBM) layer formed over, and in electrical contact with, the conductive material and formed over at least a portion of the second insulation layer of the pedestal member.
申请公布号 US8563416(B2) 申请公布日期 2013.10.22
申请号 US201113194616 申请日期 2011.07.29
申请人 ERWIN BRIAN MICHAEL;MELVILLE IAN D.;MISRA EKTA;SCOTT GEORGE JOHN;INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 ERWIN BRIAN MICHAEL;MELVILLE IAN D.;MISRA EKTA;SCOTT GEORGE JOHN
分类号 H01L21/44;H01L21/4763 主分类号 H01L21/44
代理机构 代理人
主权项
地址