发明名称 Shielded gate trench MOSFET device and fabrication
摘要 A semiconductor device includes a substrate, an active gate trench in the substrate, the active gate trench has a first top gate electrode and a first bottom source electrode, and a gate runner trench comprising a second top gate electrode and a second bottom source electrode. The second top gate electrode is narrower than the second bottom source electrode.
申请公布号 US8564055(B2) 申请公布日期 2013.10.22
申请号 US201213456406 申请日期 2012.04.26
申请人 CHEN JOHN;LEE IL KWAN;CHANG HONG;LI WENJUN;BHALLA ANUP;YILMAZ HAMZA;ALPHA AND OMEGA SEMICONDUCTOR INCORPORATED 发明人 CHEN JOHN;LEE IL KWAN;CHANG HONG;LI WENJUN;BHALLA ANUP;YILMAZ HAMZA
分类号 H01L29/78 主分类号 H01L29/78
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