CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD WHICH CAN REMOVE RESIDUAL REACTION GAS FROM SHOWERHEAD TO OUTSIDE OF REACTOR

摘要

PURPOSE: An apparatus and method for chemical vapor deposition are provided to prevent a reaction gas remaining inside a shower head from being continuously and undesirably jetted to a substrate in a process for switching the feeding of the reaction gas to the shower head. CONSTITUTION: An apparatus for chemical vapor deposition includes a reaction chamber (10), a shower head (20), and process gas feeding units (50,51,52,53,51a,52a,53a). The process gas feeding units includes a control unit, a reaction gas feeding pipe, a jet control gas feeding pipe, a bypass discharging pipe, a reaction gas feeding valve, a jet control gas feeding valve, and a bypass discharging valve. The reaction gas feeding pipe, the jet control gas feeding pipe, and the bypass discharging pipe are connected to the shower head, and respectively have the reaction gas feeding valve, the jet control gas feeding valve, and the bypass discharging valve. The control unit controls to open or close the reaction gas feeding valve, the jet control gas feeding valve, and the bypass discharging valve. [Reference numerals] (20) Shower head; (50) Control tool; (70) Ventilation pump; (AA) Spraying control gas; (BB) Discharge