发明名称 LIQUID PROCESSING APPARATUS
摘要 <p>PURPOSE: A liquid processing apparatus is provided to prevent processing liquid from being reattached to a substrate by vertically arranging a top guide ring and a bottom guide ring around the substrate. CONSTITUTION: A substrate holding unit horizontally holds a substrate. A rotation driving unit rotates the substrate holding unit. A processing liquid supply unit (411,412) supplies processing liquid to the substrate. A rotary cup (51) guides the processing liquid. A top guide ring (42) and a bottom guide ring (43) are separately arranged.</p>
申请公布号 KR20130115143(A) 申请公布日期 2013.10.21
申请号 KR20130038101 申请日期 2013.04.08
申请人 TOKYO ELECTRON LIMITED 发明人 MIZUNO TSUYOSHI
分类号 H01L21/302 主分类号 H01L21/302
代理机构 代理人
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