| 摘要 |
<p>The present invention provides a curable composition that is to be used in nanoimprinting for transcribing minute recess/protrusion patterns by pressing a nanoimprinting mold, said curable composition comprising composite resin further comprising: polysiloxane segments having a silanol group and/or a hydrolyzable silyl group, and a polymerizable double bond; and polymer segments other than polysiloxane. The present invention also provides a nanoimprinting compact, a resist film, a resin mold, and a pattern forming method using the nanoimprinting composition.</p> |
