SYSTEM AND METHOD OF ION BEAM SOURCE FOR SEMICONDUCTOR ION IMPLANTATION

摘要

PURPOSE: A line scanning device for the density distribution equalizing of an acceleration ion beam and a method thereof are provided to increase currents of an ion beam by including an electric field discharge array. CONSTITUTION: An ionization chamber (101) provides ion during an ion injection process. An electronic beam source device (110) is included in the ionization chamber. The electronic beam source device includes an electric field discharge array. The array includes a plurality of emitters. The emitters generate electrons in vacuum.