PLASMA GENERATING APPARATUS AND METHOD OF PLASMA PROCESSING OF SUBSTRATE

摘要

PURPOSE: A plasma generating apparatus and a plasma treatment method of a substrate are provided to stably generate high-density plasma even around atmospheric pressure by suppressing a phenomenon where plasma is transferred to arc. CONSTITUTION: A plasma generating apparatus (100) comprises a first electrode (120) and a second electrode (140). The first electrode settles a substrate (130). The second electrode comprises: multiple capillaries (143) including a body (142) which is formed on a surface opposing to the first electrode and limits a cavity (141); a porous conductive layer on the bottom (141a) of the cavity; and a discharge gas passageway (170). The porous conductive layer includes multiple fine pores which are connected to one another in order to allow the inflow of gas into the inside of the cavity.