| 摘要 |
A radiation-sensitive resin composition includes: a polymer having a first structural unit derived from a compound represented by a formula (1), and a second structural unit derived from a compound represented by a formula (2); an acid generator; and an organic solvent. In the formula (1), R 1 represents a ring structure having 3 to 8 carbon atoms taken together with a carbon atom constituting a lactone ring; R 2 represents a fluorine atom, a hydroxyl group or an organic group having 1 to 20 carbon atoms; and a is an integer of 0 to 6. In a case where a is 2 or greater, a plurality of R 2 s are identical or different, or represent a ring structure taken together with each other. At least one group of R 1 and R 2 has a hetero atom or a halogen atom. |
