| 摘要 |
An etchant composition is provided to etch a metal laminated film comprising a titanium or titanium alloy layer and an aluminum or aluminum alloy layer simultaneously without the damage of a substrate and with controlling a taper angle to be 30-90 degrees. An etchant composition comprises 0.01-5 wt% of at least one kind of fluorine compound selected from the group consisting of a metal salt or ammonium salt of hydrofluoric acid, hexafluorosilicic acid a metal salt or ammonium salt of hexafluorosilicic acid, tetrafluoroboric acid, and a metal salt or ammonium salt of tetrafluoroboric acid; 0.1-50 wt% of an oxidizing agent; optionally at least one selected from amide sulfuric acid, acetic acid and hydrochloric acid. Preferably the oxidizing agent is nitric acid or methanesulfonic acid. |
