A METHOD FOR MEASURING PATTERN AND A DEVICE THEREOF

摘要

PURPOSE: A pattern measuring method and a pattern measuring device are provided to detect a change in a white band width of SEM images photographed at different acceleration voltages. CONSTITUTION: A pattern measuring method includes the following steps of: acquiring SEM images of measurement target patterns (72) at two preset acceleration voltages respectively; detecting the white band width of the measurement target patterns from the SEM images; obtaining a change in the white band width by calculating the difference of the detected white band width of the images; and obtaining an angle of a lateral wall (72a) of the measurement target patterns based on the change in the white band width. [Reference numerals] (AA) Acceleration voltage V_1; (BB,DD) Injection direction; (CC) Acceleration voltage V_2 (=V_1+ΔV)