发明名称 PLASMA GENERATING APPARATUS AND METHODS FOR PROCESSING AN OBJECT USING THE SAME
摘要 PURPOSE: A plasma generator and a processing method using the same are provided to effectively execute a vacuum evaporation without a lithography process. CONSTITUTION: A plasma generator comprises a first electrode (120), a target (130), and a plurality of second electrodes (150a, 150b, 150c). The first electrode includes a plurality of conductive patterns (124). The target is arranged on the first electrode by directly connecting to a part of the conductive patterns. The plurality of the second electrodes is separated from the target, and atmospheric pressure is individually generated with the target.
申请公布号 KR20130114525(A) 申请公布日期 2013.10.18
申请号 KR20120036961 申请日期 2012.04.09
申请人 KOREA INSTITUTE OF MACHINERY & MATERIALS 发明人 NAM, KEE SEOK;KANG, JAE WOOK;KWON, JUNG DAE;KIM, DONG HO;KIM, CHANG SU;RYU, SEOUNG YOON;PARK, SUNG GYU;YOON, JUNG HEUM;LEE, GUN HWAN;LEE, SUNG HUN;JEONG, YONG SOO
分类号 H05H1/34;C23C16/50;H01L21/205;H05H1/46 主分类号 H05H1/34
代理机构 代理人
主权项
地址