SPUTTERING TARGET AND PROCESS FOR PRODUCTION THEREOF

摘要

PROBLEM TO BE SOLVED: To provide a sputtering target which comprises a sintered material containing NaNbOand can be used in a DC sputtering method, and to provide a process for producing the same.SOLUTION: A sputtering target comprises a sintered material doped with a Group-2 element and containing NaNbO. The sintered material has an electric resistance of 15 k&OHgr; or less.