发明名称 PHOTOSENSITIVE RESIN COMPOSITION, AND METHOD FOR PRODUCING PATTERN USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having high sensitivity and excellent in resolution and rectangularity.SOLUTION: A photosensitive resin composition includes (A) a polymer component including a polymer having a monomer unit protected by an acid decomposable group, (B) a photoacid generator, (C) a compound represented by the following general formula (0), and (D) a solvent. (In the general formula (0), Rand Reach represent an aryl group, or a heterocyclic structure having one or more ethylenic bonds. Lrepresents a divalent to tetravalent connecting group having 2 to 4 ethylenic bonds, and n and m each represent 1 or 2.)
申请公布号 JP2013213867(A) 申请公布日期 2013.10.17
申请号 JP20120083123 申请日期 2012.03.30
申请人 FUJIFILM CORP 发明人 NAKAMURA HIDEYUKI;FUJIMOTO SHINJI
分类号 G03F7/004;C08F8/00;G03F7/039;H01L51/50;H05B33/02;H05B33/10 主分类号 G03F7/004
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