发明名称 FILM FORMING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a film forming apparatus capable of achieving high-speed film formation while suppressing an increase in running cost and a maintenance man-hour.SOLUTION: A film forming apparatus 1 includes a hollow cathode gun 2 which has a discharge cathode 21 and an electrode 22 to generate plasma, a plasma deformation chamber 4 which is located adjacent to the hollow cathode gun 2 and deforms the plasma into a sheet form with a magnet 5 arranged at the periphery, and a film-forming chamber 6 which is located adjacent to the plasma deformation chamber 4 and forms a film with the plasma deformed into a sheet form. In the film forming apparatus 1, a reactive gas introducing part 3 is provided between the electrode 22 and the magnet 5.
申请公布号 JP2013213258(A) 申请公布日期 2013.10.17
申请号 JP20120084088 申请日期 2012.04.02
申请人 NACHI FUJIKOSHI CORP 发明人 TAKAI KENJI
分类号 C23C14/34 主分类号 C23C14/34
代理机构 代理人
主权项
地址