| 摘要 |
The invention relates to a photo mask base plate and a manufacturing method thereof, a photo mask manufacturing method and a pattern transfer method. Even fine transfer patterns can also be transferred loyally based on pattern design with high precision. The photo mask base plate is used for being the photo mask. The patterns for transferring are formed on main surface by the photo mask. Through the installation of a far contact printer, the transferring is performed by arranging proximity gap between the transferred patterns on a stage of the far contact printer. The base position change of the proximity gap produced by installing the photo mask base plate to the far contact printer is reduced. The shape processing makes the inherent change extracted from the change from the base position of the proximity gap is reduced. |
