POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERN, AND ELECTRONIC COMPONENT

摘要

PROBLEM TO BE SOLVED: To provide a positive photosensitive resin composition, a method for producing a pattern, and an electronic component which enable development with an alkaline aqueous solution and give a pattern in a good shape with excellent heat resistance and mechanical properties.SOLUTION: The positive photosensitive resin composition contains (a) polybenzoxazole or a polybenzoxazole precursor polymer having a structural unit represented by either a general formula (1) or (2) and satisfying conditions (i) and/or (ii), (b) a compound that generates an acid by being irradiated with active light ray and (c) a compound having a structure crosslinkable or polymerizable with said component (a) by heat, represented by a general formula (3).