| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for patterning a layer including a block copolymer, by which a substrate having a nanostructure with more flexibly designed locations and orientation on a substrate surface can be produced by using phase separation of the block copolymer.SOLUTION: A method for patterning a layer including a block copolymer includes: step (1) of applying a primer agent comprising a resin component and a basic compound component in an amount of 1 to 50 parts by mass with respect to 100 parts by mass of the resin component on a substrate 1 to form a layer 2 of the primer agent; step (2) of forming a layer 3 including a block copolymer in which a plurality of types of blocks are bonded, on a surface of the layer formed of the primary agent 2, and then subjecting the layer 3 containing the block copolymer to phase separation; and step (3) of selectively removing a phase 3a comprising at least one type of block in the plurality of types of blocks constituting the block copolymer, in the layer 3 including the block copolymer. |
