MASK DESIGN METHOD, PROGRAM, AND MASK DESIGN SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide a mask design method, a program thereof, and a mask design system.SOLUTION: The mask design system according to the present invention includes: an optimization unit 120 having a global mask optimization section 122 and a global light source optimization section 123; and an optical domain simultaneous optimization unit (FDJO) 124. The optimization unit 120 performs a non-linear optimization for an optical domain representation of a mask pattern under a constraint condition that a value of a negative deviation of the object domain representation at a prescribed evaluation point of a restored object domain representation is smaller than a value of a predetermined negative threshold of the evaluation point.