HARMONIC RESIST MODEL FOR USE IN LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a method of determining an image of a mask pattern in a resist coated on a substrate.SOLUTION: A method comprises the steps of: determining an aerial image of a mask pattern at a substrate level; convolving the aerial image with at least two orthogonal convolution kernels; and determining a resist image representing the mask pattern in a resist.