发明名称 |
STRAINED SOI FINFET ON EPITAXIALLY GROWN BOX |
摘要 |
A semiconductor structure includes an epitaxial insulator layer located on a substrate. A fin structure is located on the epitaxial insulator layer, where at least one epitaxial source-drain region having an embedded stressor is located on the epitaxial insulator layer and abuts at least one sidewall associated with the fin structure. The epitaxial source-drain region having the embedded stressor provides stress along the fin structure such that the provided stress is based on a lattice mismatch between the epitaxial source-drain region, and both the epitaxial insulator layer and the one side-wall associated with the fin structure.
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申请公布号 |
US2013270638(A1) |
申请公布日期 |
2013.10.17 |
申请号 |
US201213445959 |
申请日期 |
2012.04.13 |
申请人 |
ADAM THOMAS N.;CHENG KANGGUO;KHAKIFIROOZ ALI;REZNICEK ALEXANDER;SREENIVASAN RAGHAVASIMHAN;INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
ADAM THOMAS N.;CHENG KANGGUO;KHAKIFIROOZ ALI;REZNICEK ALEXANDER;SREENIVASAN RAGHAVASIMHAN |
分类号 |
H01L29/78;H01L21/336 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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