PLASMA GENERATION DEVICE, VAPOR DEPOSITION DEVICE, AND VAPOR DEPOSITION METHOD

摘要

Provided is a plasma generation device that can form plasma suitable for a plasma-assisted method. The present invention is characterized by having a plasma gun (3) provided with: a chamber (2); a cathode (7) that discharges electrons and is disposed in a manner so as to face the interior of the chamber (2); and a focusing coil (11) that forms magnetic flux that guides the electrons discharged from the cathode (7). The present invention is further characterized by: having an auxiliary magnet (4) that forms magnetic flux within the chamber (2); and imposing energizing current to the focusing coil (11) in a manner so that the orientation of the magnetic flux fluctuates.