发明名称 POLISHING PAD WITH LIGHT-STABLE LIGHT-TRANSMITTING REGION
摘要 The invention provides a polishing pad that contains at least one light-transmitting region and optionally a polishing pad body. The light-transmitting region is composed of a material comprising (a) a polymeric resin and (b) at least one light-absorbing compound, and the light-transmitting region has a total light transmittance of 25% or more at one or more wavelengths in a range of 250 nm to 395 nm.
申请公布号 WO2013154913(A1) 申请公布日期 2013.10.17
申请号 WO2013US35314 申请日期 2013.04.04
申请人 CABOT MICROELECTRONICS CORPORATION 发明人 PRASAD, ABANESHWAR
分类号 H01L21/304;B24B37/04 主分类号 H01L21/304
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