发明名称 FLOW RATE SENSOR AND METHOD FOR MAKING SAME
摘要 Provided is a technique for suppressing variations in performance of flow rate sensors and improving the performances thereof. For example, in any given cross-section parallel to the traveling direction of a gas flowing over an exposed flow-rate detecting unit (FDU) formed on a semiconductor chip (CHP1), ejection pins (EJPN), which do not overlap the semiconductor chip (CHP1) located in the vicinity of the center but are located in respective areas outside the semiconductor chip (CHP1), are pushed up from a bottom mold (BM), thereby spacing a sealer from the bottom mold (BM). In this way, according to this embodiment (1) of the invention, the deformation imparted to the sealer during the spacing of the sealer from the bottom mold can be reduced as compared with a case of spacing of the sealer from the bottom mold (BM) with the ejection pins (EJPN) located in respective areas overlapping the semiconductor chip (CHP1).
申请公布号 WO2013154144(A1) 申请公布日期 2013.10.17
申请号 WO2013JP60888 申请日期 2013.04.11
申请人 HITACHI AUTOMOTIVE SYSTEMS, LTD. 发明人 KONO, TSUTOMU;HANZAWA, KEIJI;TOKUYASU, NOBORU;TASHIRO, SHINOBU
分类号 G01F1/68;H01L21/56 主分类号 G01F1/68
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