发明名称 SEMICONDUCTOR DEVICE STRUCTURE HAVING VERTICAL DIELECTRIC LAYER
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device which can avoid charging of a drift control zone 21.SOLUTION: A semiconductor device of a present embodiment comprises: a semiconductor body 100 including a first surface 101, a second surface 102' an edge 103 and an edge region 104 adjacent to the edge 103; a drift zone 11 and a drift control zone 21 which are dielectrically isolated from each other by a first dielectric layer 31 extending in a perpendicular direction to the semiconductor body 100; a first connection zone 200 arranged in a region of the second surface 102' of the semiconductor body 100, which contacts the drift zone 11 and the edge region 104; a third dielectric layer 43 arranged between the drift zone 11 and the first connection zone 200; and a rectifier cell 72 connected between a connection zone 24 and a connection zone 71 of the edge region 104. The drift control zone 21 is dielectrically isolated from the edge region 104 at least by a second dielectric layer 32.
申请公布号 JP2013214773(A) 申请公布日期 2013.10.17
申请号 JP20130146627 申请日期 2013.07.12
申请人 INFINEON TECHNOLOGIES AUSTRIA AG 发明人 MAUDER ANTON;SEDLMAIER STEFAN;ERICHSEN RALF;WEBER HANS;HAEBERLEN OLIVER;HIRLER FRANZ
分类号 H01L29/78;H01L21/336;H01L29/06 主分类号 H01L29/78
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