发明名称 |
SEMICONDUCTOR DEVICE STRUCTURE HAVING VERTICAL DIELECTRIC LAYER |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor device which can avoid charging of a drift control zone 21.SOLUTION: A semiconductor device of a present embodiment comprises: a semiconductor body 100 including a first surface 101, a second surface 102' an edge 103 and an edge region 104 adjacent to the edge 103; a drift zone 11 and a drift control zone 21 which are dielectrically isolated from each other by a first dielectric layer 31 extending in a perpendicular direction to the semiconductor body 100; a first connection zone 200 arranged in a region of the second surface 102' of the semiconductor body 100, which contacts the drift zone 11 and the edge region 104; a third dielectric layer 43 arranged between the drift zone 11 and the first connection zone 200; and a rectifier cell 72 connected between a connection zone 24 and a connection zone 71 of the edge region 104. The drift control zone 21 is dielectrically isolated from the edge region 104 at least by a second dielectric layer 32. |
申请公布号 |
JP2013214773(A) |
申请公布日期 |
2013.10.17 |
申请号 |
JP20130146627 |
申请日期 |
2013.07.12 |
申请人 |
INFINEON TECHNOLOGIES AUSTRIA AG |
发明人 |
MAUDER ANTON;SEDLMAIER STEFAN;ERICHSEN RALF;WEBER HANS;HAEBERLEN OLIVER;HIRLER FRANZ |
分类号 |
H01L29/78;H01L21/336;H01L29/06 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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