发明名称 |
VARIABLE POLARIZATION WAFER INSPECTION |
摘要 |
<p>Methods and systems for variable polarization wafer inspection are provided. One system includes one or more polarizing components position in one or more paths of light scattered from a wafer and detected by one or more channels of an inspection system. The polarizing component(s) are configured to have detection polarization(s) that are selected from two or more polarization settings for the polarizing component(s).</p> |
申请公布号 |
WO2013155008(A1) |
申请公布日期 |
2013.10.17 |
申请号 |
WO2013US35660 |
申请日期 |
2013.04.08 |
申请人 |
KLA-TENCOR CORPORATION |
发明人 |
PENG, XIANZHAO;WANG, MARK SHI;CHEN, GRACE HSIU-LING |
分类号 |
H01L21/66 |
主分类号 |
H01L21/66 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|