| 摘要 |
A cleaning apparatus, a cleaning method, a cleaning system, and an operating method thereof are provided to remove foreign materials and to prevent a short circuit between patterns by causing a chemical and physical reaction using plasma. A plasma unit(10) is formed to produce a plasma source. An exhaust unit(50) is arranged around the plasma unit in order to exhaust byproducts separated from foreign materials of a target material in a plasma source reaction process. The plasma unit includes a plasma gun for producing and injecting the plasma source, a power supply part for supplying a voltage having a predetermined frequency to an electrode part, and a gas supply part for supplying a predetermined gas mixture to the electrode part. |
