发明名称 DETECTION APPARATUS, EXPOSURE APPARATUS, AND DEVICE FABRICATION METHOD
摘要 The present invention provides a detection apparatus which detects an upper-surface mark and lower-surface mark formed on an upper surface and lower surface, respectively, of a substrate, the apparatus including an optical system configured to form an image of the lower-surface mark on a light-receiving surface of a photoelectric conversion device using a first light, with a wavelength which is transmitted through the substrate, which is emitted by a light source, applied to the lower-surface mark from the upper surface of the substrate, and reflected by the lower-surface mark, and to form an image of the upper-surface mark on the light-receiving surface of the photoelectric conversion device using a second light, with a wavelength which is not transmitted through the substrate, which is emitted by the light source, applied to the upper-surface mark from the upper surface of the substrate, and reflected by the upper-surface mark.
申请公布号 KR101319136(B1) 申请公布日期 2013.10.17
申请号 KR20100074654 申请日期 2010.08.02
申请人 发明人
分类号 H01L21/027 主分类号 H01L21/027
代理机构 代理人
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