| 摘要 |
<p>The present invention relates to a method for producing, on the surface of at least one side of a substrate, a regular structure of contacts, in which said contacts are arranged in a non-contiguous manner and are at least ten times smaller than the separation between two adjacent contacts of said structure, the method comprising at least the following steps: a) arranging a substrate provided with a regular structure of contacts on the surface of at least one of the sides thereof, b) subjecting said structure on the substrate to anisotropic etching in the presence of directive plasma so as to reduce the amount of material in each contact, and c) subjecting said structure to thermal treatment at a temperature of Tf-200°C to Tf-50°C, where Tf is the melting temperature of the contacts.</p> |
