发明名称 |
ANTIREFLECTIVE COATING COMPOSITION AND PROCESS FOR MANUFACTURING MICROELECTRONIC DEVICE |
摘要 |
<p>The invention related to an antireflective coating comprising a mixture of a first polymer and a second polymer, and a thermal acid generator, where the first polymer comprises at least one fluoroalcohol moiety, at least one aliphatic hydroxyl moiety, and at least one acid moiety other than fluoroalcohol with a pKa in the range of about 8 to about 11; where the second polymer is a reaction product of an aminoplast compound with a compound comprising at least one hydroxyl and/or at least one acid group. The invention further relates to a process for using the novel composition to form an image.</p> |
申请公布号 |
KR20130114071(A) |
申请公布日期 |
2013.10.16 |
申请号 |
KR20137000173 |
申请日期 |
2011.06.01 |
申请人 |
AZ ELECTRONIC MATERIALS USA CORP. |
发明人 |
YAO HUIRONG;YIN JIAN;LIN GUANYANG;NEISSER MARK O.;ABDALLAH DAVID J. |
分类号 |
G02B1/04;G02B1/11;G03F7/004;G03F7/09 |
主分类号 |
G02B1/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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