发明名称 |
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM |
摘要 |
A pattern forming, method, includes: (i) forming a film from an actinic ray-sensitive or radiation-sensitive resin composition that contains (A) a compound capable of generating an acid upon irradiation with an actinic ray or radiation and decomposing by an action of an acid to decrease a solubility of the compound (A) for an organic solvent; (ii) exposing the film; and (iii) performing development by using a developer containing an organic solvent. |
申请公布号 |
KR20130113964(A) |
申请公布日期 |
2013.10.16 |
申请号 |
KR20127033917 |
申请日期 |
2011.06.22 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
KATAOKA SHOHEI;IWATO KAORU;FUJII KANA;KAMIMURA SOU;ENOMOTO YUICHIRO;KATO KEITA;YAMAGUCHI SHUHEI |
分类号 |
G03F7/26;G03F7/039;G03F7/32;H01L21/027 |
主分类号 |
G03F7/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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