发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, EVAPORATION SYSTEM AND MIST FILTER
摘要 PURPOSE: A method for manufacturing a semiconductor device, a substrate processing apparatus, an evaporating system, and a mist filter are provided to easily form a film on a substrate by using liquid materials. CONSTITUTION: The quantity of particles is decreased by using liquid materials. A substrate is inputted to a processing chamber. The liquid materials are inputted to a mist filter (300). The mist filter is formed by combining at least two kinds of plates (320,330) which include holes (322,332).
申请公布号 KR20130113976(A) 申请公布日期 2013.10.16
申请号 KR20130027681 申请日期 2013.03.15
申请人 HITACHI KOKUSAI ELECTRIC INC. 发明人 TAKAGI KOSUKE;TAKEBAYASHI YUJI
分类号 H01L21/205 主分类号 H01L21/205
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